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 We describe a facile method to micropattern solid substrates: breath figure lithography (BFL).  A gold mask was prepared by sputter-coating a microporous polymer film with BF arrays, and then inductively coupled plasma reactive ion etching (ICP-RIE) transferred the patterns onto silicon wafer.  The large etching rate selectivity between golden mask and substrate plays an important role in the effective transfer of the patterns.  The versatility of the method was demonstrated by forming micro-patterns on various solid substrates, such as glass and Si(Te).  Furthermore, the micro-patterns on solid substrate could be replicated by PDMS stamp, which has potential applications in soft lithography.